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dual side heating RTP system

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[Basic Infomation]
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[ULTECH]

  • South Korea South Korea
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Product Detail Information

 

[ Model ] 

-. UTR-D100N

[ Specification ] 

-. Substrate size & load capacity
                                 : 4inch wafer - 1 wafer/batch
-. Temperature range : RT~1,000 ℃
-. Double-side heating
-. Substrate holder : Quartz
-. ATM process
-. MFC: O2(20slm), N2(20slm)
-. PC control

[ Application ]

-. Thin Gate Oxidation (Low Pressure, Nano device)
-. Rapid Annealing (Atmospheric or Low Pressure)

 

Attached File