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Hot Wire CVD

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[Basic Infomation]
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[ULTECH]

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Product Detail Information

[ Model ]

 

-. HOT-002

 

[ Specification ]

 

-. Substrate size & load capacity
           : 4inch wafer - 1 wafer/batch
-. Source(gas) injection : Showerhead type
-. Molded heater, Wafer temp. 300℃, up/down, rotation
-. W wire + Temperature controller
-. Dry pump
-. Throttle valve + APC controller
-. Bubbler(heating) 2set
-. MFC: Vapor MFC for bubbler 1ea, N2(300sccm),

             Ar(300sccm, 2ea), O2(300sccm)
-. Loadlock chamber
-. PC control

 

[ Application ]

 

-. Amorphous silicon deposition
-. Poly silicon deposition
-. Silicon oxide deposition
-. Silicon nitride deposition
-. Metal oxide deposition
-. High-k dielectrics deposition

 

Attached File